发明名称 Method and apparatus for early detection of material accretion and peeling in plasma system
摘要 A method and apparatus for detecting material accretion and peeling in a system such as a plasma process chamber, including multiple optical sensors which are provided in the chamber above a gas distribution plate or other surface inside the chamber. The optical sensors are connected to a central process controller that is capable of terminating operation of the chamber and may be equipped with an alarm. In the event that the optical sensors detect asymmetries in brightness or light reflection among various portions or regions of the gas distribution plate or other surface, which asymmetries may indicate the formation of a material coating on the plate or dislodging of contaminant particles from the plate, a signal is sent to the process controller, which may be adapted to terminate the plasma process, alert operating personnel, or both.
申请公布号 US6815653(B2) 申请公布日期 2004.11.09
申请号 US20020122687 申请日期 2002.04.15
申请人 发明人
分类号 C23C16/44;G01J3/443;G01N21/55;G01N21/84;H01J37/32;(IPC1-7):H01L21/306 主分类号 C23C16/44
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