发明名称 Light emitting semiconductor device with GaInNAs active layers and GaAs spacer layers
摘要 A light emitting semiconductor device, which includes a Ga0.9In0.1As0.97 active layer disposed between lower n-Ga0.5In0.5P and upper p-Ga0.5In0.5P cladding layers, being provided with lower and upper GaAs spacing layers each intermediate the active layer and the cladding layer. The active layer is approximately lattice-matched to a GaAs substrate and has a thickness of about 0.1 mum with a photoluminescence peak wavelength of approximately 1.3 mum, and the GaAs spacing layers each have a thickness of about 2 nm.
申请公布号 US6815731(B2) 申请公布日期 2004.11.09
申请号 US20030401958 申请日期 2003.03.31
申请人 RICOH COMPANY LTD. 发明人 SATO SHUNICHI
分类号 H01L33/02;H01L33/06;H01L33/14;H01L33/30;H01L33/32;H01S5/00;H01S5/32;H01S5/323;(IPC1-7):H01L33/00 主分类号 H01L33/02
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