发明名称 SEMICONDUCTOR PROCESSING EQUIPMENT
摘要 PROBLEM TO BE SOLVED: To obtain semiconductor processing equipment in which a heat insulator is protected against break and damage when quick heating and quick cooling are performed. SOLUTION: The semiconductor processing equipment comprises a reaction chamber 4 for processing a substrate, and a heater 2 for heating the substrate 5 in the reaction chamber. The heater has a heating element 32, and a heat insulation layer on the outer circumferential side of the heating element. The heat insulation layer has a three layer structure from the heating element side toward the outer circumference wherein the bulk density of an intermediate heat insulation layer is lower than that of other layers. COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2004311775(A) 申请公布日期 2004.11.04
申请号 JP20030104204 申请日期 2003.04.08
申请人 HITACHI KOKUSAI ELECTRIC INC 发明人 SHIMADA SHINICHI;MIYATA TOSHIMITSU;TSUKAMOTO HIDEYUKI;OGAWA TOMOKAZU
分类号 H01L21/22;H01L21/205;H01L21/324;(IPC1-7):H01L21/324 主分类号 H01L21/22
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