发明名称 |
SEMICONDUCTOR PROCESSING EQUIPMENT |
摘要 |
PROBLEM TO BE SOLVED: To obtain semiconductor processing equipment in which a heat insulator is protected against break and damage when quick heating and quick cooling are performed. SOLUTION: The semiconductor processing equipment comprises a reaction chamber 4 for processing a substrate, and a heater 2 for heating the substrate 5 in the reaction chamber. The heater has a heating element 32, and a heat insulation layer on the outer circumferential side of the heating element. The heat insulation layer has a three layer structure from the heating element side toward the outer circumference wherein the bulk density of an intermediate heat insulation layer is lower than that of other layers. COPYRIGHT: (C)2005,JPO&NCIPI
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申请公布号 |
JP2004311775(A) |
申请公布日期 |
2004.11.04 |
申请号 |
JP20030104204 |
申请日期 |
2003.04.08 |
申请人 |
HITACHI KOKUSAI ELECTRIC INC |
发明人 |
SHIMADA SHINICHI;MIYATA TOSHIMITSU;TSUKAMOTO HIDEYUKI;OGAWA TOMOKAZU |
分类号 |
H01L21/22;H01L21/205;H01L21/324;(IPC1-7):H01L21/324 |
主分类号 |
H01L21/22 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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