| 摘要 |
PROBLEM TO BE SOLVED: To provide a load port for semiconductor processing equipment in which a port door can be elevated/lowered without generating dust. SOLUTION: The load port for semiconductor processing equipment comprises a port door 3 mounting a cover on the outer surface, a buffer chamber 6 defined by a wall surface surrounding the outer circumference of the port door 3 and a bottom face facing the inner surface of the port door 3, a means 4 bonded to the inner surface of the port door 3 and elevating/lowering the port door 3 along a direction perpendicular to the surface of the port door 3, and a bellows 31 located on the outer circumference of the elevating/lowering means 4. The bellows 31 has one end 31a coupled with the bottom face of the buffer chamber 6 and the other end 31b secured to the elevating/lowering means 4 on the outside of the buffer chamber 6. COPYRIGHT: (C)2005,JPO&NCIPI
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