MASK BLANK FOR CHARGED PARTICLE BEAM EXPOSURE, AND METHOD FOR MANUFACTURING MASK

摘要

PROBLEM TO BE SOLVED: To provide a mask blank for charged particle beam exposure wherein struts high in dimensional accuracy are formed in a short time by using a method of largely reducing the cost, and to provide a method for manufacturing a mask.

SOLUTION: The method is for manufacturing a mask blank for charged particle beam exposure provided at least with a membrane 12 and with struts 14 for supporting the membrane 12, with an etch-stop layer 13 in between. For the formation of the struts 14, sandblasting is applied partway and then dry etching is performed as far as the etch-stop layer 13 for the completion of the struts 14.

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