发明名称 PROCESS FOR MANUFACTURING SEMICONDUCTOR DEVICE
摘要 PROBLEM TO BE SOLVED: To provide a semiconductor device which can be manufactured on wafer level without using conductive adhesive. SOLUTION: A semiconductor device can be manufactured on wafer level by providing a step for forming a first electrode on the first major surface of a semiconductor wafer by plating a first metal layer, a step for forming a trench by dicing a semiconductor element to leave the first metal layer, a step for forming a bump on the second major surface of the semiconductor element and thermocompressing the bump and a metal layer, e.g. a metal plate, to form an electrode, a step for filling the trench with sealing resin, and a step for dicing resin between the substrate and the semiconductor element at once into pieces of semiconductor element. COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2004311762(A) 申请公布日期 2004.11.04
申请号 JP20030103979 申请日期 2003.04.08
申请人 MATSUSHITA ELECTRIC IND CO LTD 发明人 TOKIDA SHIGEKI;EGUCHI MUNEHIRO
分类号 H01L21/56;H01L23/48;(IPC1-7):H01L23/48 主分类号 H01L21/56
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