发明名称 METHOD OF CUTTING PROCESSED OBJECT
摘要 A method of cutting an object which can accurately cut the object is provided. An object to be processed 1 such as a silicon wafer is irradiated with laser light L while a light-converging point P is positioned therewithin, so as to form a modified region 7 due to multiphoton absorption within the object 1, and cause the modified region 7 to form a starting point region for cutting 8 shifted from the center line CL of the thickness of the object 1 toward the front face 3 of the object 1 along a line along which the object should be cut. Subsequently, the object 1 is pressed from the rear face 21 side thereof. This can generate a fracture from the starting point region for cutting 8 acting as a start point, thereby accurately cutting the object 1 along the line along which the object should be cut. <IMAGE>
申请公布号 KR20040093139(A) 申请公布日期 2004.11.04
申请号 KR20047014372 申请日期 2003.03.11
申请人 发明人
分类号 B23K26/38;B28D1/22;B28D5/00;C03B33/02;C03B33/033;C03B33/07;H01L21/301 主分类号 B23K26/38
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