POLISHING PAD COMPRISING DIENE-BASED CROSSLINKED ELASTOMER AND POLYMER HAVING ACID ANHYDRIDE STRUCTURE, AND CHEMICAL MECHANICAL POLISHING METHOD USING THE POLISHING PAD

摘要

PURPOSE: Provided are a polishing pad which has a high polishing velocity, a good flatness, and an excellent polishing efficiency to both insulating layers and metal layers and a chemical mechanical polishing method using the polishing pad. CONSTITUTION: The polishing pad comprises 70-99.9 wt% of a diene-based crosslinked elastomer; and 0.1-30 wt% of a polymer having an acid anhydride structure, and has a specific gravity of 0.9-1.2. Preferably the diene-based crosslinked elastomer is a butadiene crosslinked elastomer or an isoprene crosslinked elastomer; and the polymer having an acid anhydride structure is a polymer having an acid anhydride structure only at a main chain, a polymer having an acid anhydride structure only at a side chain, or a polymer having an acid anhydride structure at both main chain and side chain. Preferably the polymer having an acid anhydride structure has an acid number of 0.1-500 mg KOH/g.