发明名称 |
SURFACE TREATMENT METHOD, SURFACE TREATMENT APPARATUS, SURFACE TREATMENT SUBSTRATE, ELECTRO-OPTICAL DEVICE AND ELECTRONIC APPARATUS |
摘要 |
<p><P>PROBLEM TO BE SOLVED: To uniformly control a contact angle of a liquid-state object and a substrate even when the substrate is large. <P>SOLUTION: The surface treatment method includes the steps of applying liquid repellent treatment to a surface of a substrate 11, and applying lyophilization treatment to the surface of the substrate 11 to which the liquid repellent treatment is applied, by irradiating the surface with energy light. The step is implemented while suppressing the dispersion of integral illuminance of the energy light on the surface of the substrate less than or equal with 20%. <P>COPYRIGHT: (C)2005,JPO&NCIPI</p> |
申请公布号 |
JP2004311958(A) |
申请公布日期 |
2004.11.04 |
申请号 |
JP20040035082 |
申请日期 |
2004.02.12 |
申请人 |
SEIKO EPSON CORP |
发明人 |
HIRAI TOSHIMITSU;HASEI HIRONOBU |
分类号 |
G02F1/1333;B05D3/06;G01N13/02;G02F1/1343;G06K19/077;H01J9/20;H01L21/288;H01L21/3205;H01L21/336;H01L29/786;H05K3/10;H05K3/12;H05K3/38;(IPC1-7):H05K3/10;H01L21/320;G02F1/133 |
主分类号 |
G02F1/1333 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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