发明名称 |
OPTICAL ARRANGEMENT OF AUTOFOCUS ELEMENTS FOR USE WITH IMMERSION LITHOGRAPHY |
摘要 |
An autofocus unit is provided to an immersion lithography apparatus for having a fluid over a target surface of a workpiece and an image pattern projected on this target surface through the fluid. The autofocus unit has an optical element such as a projection lens disposed opposite and above the target surface. An autofocus light source is arranged to project a light beam obliquely at a specified angle such that this light beam passes through the fluid and is reflected by the target surface of the workpiece at a specified reflection position which is below the optical element. A receiver receives and analyzes the reflected light. Correction lenses may be disposed on the optical path of the light beam for correcting propagation of the light beam. |
申请公布号 |
WO2004095135(A2) |
申请公布日期 |
2004.11.04 |
申请号 |
WO2004US11287 |
申请日期 |
2004.04.12 |
申请人 |
NIKON CORPORATION;NOVAK, W., THOMAS |
发明人 |
NOVAK, W., THOMAS |
分类号 |
G03F7/20;G03F9/00 |
主分类号 |
G03F7/20 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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