发明名称 Surface emitting semiconductor laser and manufacturing method thereof
摘要 There is provided a surface emitting semiconductor laser satisfying a requirement of making a transverse mode stable and having characteristics of high output power, low resistance, high efficiency, and high speed response and a method for manufacturing the surface emitting semiconductor laser. Five holes are formed on the top surface of an upper multilayer reflection film formed in the shape of a post by the use of a focused ion beam (FIB) processing unit. One hole is formed on the surface of an upper multilayer reflection film corresponding to the center position of a square current injection region which is about 8 mum square and the remaining four holes are formed at the corners of the square current injection region, for example, at the positions about 2 mum square away from the one hole to produce four light emitting spots.
申请公布号 US2004219699(A1) 申请公布日期 2004.11.04
申请号 US20040801821 申请日期 2004.06.22
申请人 FUJI XEROX CO., LTD.;FUMIO KOYAMA C/O TOKYO INSTITUTE OF TECHNOLOGY 发明人 KOYAMA FUMIO;UEKI NOBUAKI
分类号 H01S5/028;H01S5/042;H01S5/10;H01S5/183;(IPC1-7):H01L21/00;H01S3/08 主分类号 H01S5/028
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