| 摘要 |
PROBLEM TO BE SOLVED: To provide a heat developable photosensitive material having excellent contamination resistance of the material surfaces and also excellent photographic performances. SOLUTION: The heat developable photosensitive material is obtained by disposing on a support: an image forming layer containing a photosensitive silver halide, a non-photosensitive organic silver salt, a reducing agent and a binder; and a non-photosensitive outermost layer on the surface side of the support on which the image forming layer is disposed. The outermost layer contains a copolymer, as starting materials having at least a monomer (M1) having a salt generating group or a polyalkylene oxide group and also having a radical-polymerizable unsaturated bond, and a monomer (M2) having a fluorine-containing radical-polymerizable unsaturated bond. COPYRIGHT: (C)2005,JPO&NCIPI
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