RESIST COMPOSITION COMPRISING BENZYL ALCOHOL OR ITS DERIVATIVE AS ORGANIC SOLVENT, AND ORGANIC SOLVENT FOR REMOVING RESIST

摘要

PURPOSE: A resist composition and an organic solvent for removing resist are provided, to improve flowability in coating, the uniformity of a thin film on a large-sized substrate and storage stability. CONSTITUTION: The resist composition comprises an alkali-soluble novolac resin; a naphthoquinonediazide-based photosensitive compound; and an organic solvent, wherein the organic solvent comprises 1-35 wt% of benzyl alcohol or its derivative. Also the resist composition comprises an alkali-soluble acryl-based resin or novolac resin; a compound which generates a strong acid or radical by the irradiation of UV rays; a curing agent; and an organic solvent, wherein the organic solvent comprises 1-35 wt% of benzyl alcohol or its derivative. The organic solvent for removing resist comprises benzyl alcohol or its derivative.