| 摘要 |
PROBLEM TO BE SOLVED: To provide a placing base for a microwave oven capable of heating a placed object very efficiently while preventing heating unevenness very easily and positively without taking time by allowing not only the direct incidence ofμ-wave to the lower face of the placed object but also the incidence ofμ-wave which entered a surface facing the lower face, to the lower face of the placed object. SOLUTION: This placing base for the microwave oven is constituted by providing the upper face of a placing part 1 with a plurality of support projecting parts 3 for supporting the placed object 2 heated by irradiation ofμ-wave, and providing aμ-wave reflecting face 4 at the upper face of the placing part 1 facing the lower face of the placed object 2 provided in a laid state among the support projecting parts 3 of the placing part 1 while being supported by the support projecting parts 3. COPYRIGHT: (C)2005,JPO&NCIPI
|
