发明名称 |
SEMICONDUCTOR MEMORY DEVICE PREVENTING LEANING AND LIFTING OF LOWER ELECTRODE AND MANUFACTURING METHOD THEREOF |
摘要 |
PURPOSE: A semiconductor memory device and a method for manufacturing the same are provided to prevent leaning and lifting of a lower electrode by using an improved lower electrode pattern. CONSTITUTION: A plurality of plugs(58) are formed on a semiconductor substrate(50). A plurality of lower electrodes of a capacitor are formed to contact the plugs. At this time, a first lower electrode pattern(62c) of cup or cylindrical shape is formed at a center region of a cell matrix, and a second lower electrode pattern(62b) of stack or box shape is formed at edge regions of the cell matrix.
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申请公布号 |
KR20040092767(A) |
申请公布日期 |
2004.11.04 |
申请号 |
KR20030027078 |
申请日期 |
2003.04.29 |
申请人 |
HYNIX SEMICONDUCTOR INC. |
发明人 |
CHOI, UNG;JANG, HEON YONG |
分类号 |
H01L27/108;(IPC1-7):H01L27/108 |
主分类号 |
H01L27/108 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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