发明名称 SEMICONDUCTOR MEMORY DEVICE PREVENTING LEANING AND LIFTING OF LOWER ELECTRODE AND MANUFACTURING METHOD THEREOF
摘要 PURPOSE: A semiconductor memory device and a method for manufacturing the same are provided to prevent leaning and lifting of a lower electrode by using an improved lower electrode pattern. CONSTITUTION: A plurality of plugs(58) are formed on a semiconductor substrate(50). A plurality of lower electrodes of a capacitor are formed to contact the plugs. At this time, a first lower electrode pattern(62c) of cup or cylindrical shape is formed at a center region of a cell matrix, and a second lower electrode pattern(62b) of stack or box shape is formed at edge regions of the cell matrix.
申请公布号 KR20040092767(A) 申请公布日期 2004.11.04
申请号 KR20030027078 申请日期 2003.04.29
申请人 HYNIX SEMICONDUCTOR INC. 发明人 CHOI, UNG;JANG, HEON YONG
分类号 H01L27/108;(IPC1-7):H01L27/108 主分类号 H01L27/108
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