发明名称 IN-LIQUID PROCESSING APPARATUS FOR PHOTOSENSITIVE MATERIAL
摘要 PROBLEM TO BE SOLVED: To shorten the conveyance path and to enable rapid processing, by promoting liquid processing by enhancing the efficiency and performance of the liquid processing to a photosensitive material, and to provide an in-liquid processing apparatus for a photosensitive material capable of maintaining squeeze performance even if the photosensitive material curls. SOLUTION: Housing 42 in which a processing space 74 which stores a processing liquid has been formed is disposed in a partition wall between processing chambers which are arranged in a main body of a processing tank and each store a processing liquid. Photosensitive material conveyance paths 44 for carrying a photosensitive material in and out of the processing space 74 are set in the housing 42. A processing liquid passage preventing means 54 which passes only a photosensitive material A is attached to each photosensitive material conveyance path 44. Processing liquid replacing means 72 to replace the processing liquid stored in the processing space 74 are provided in the housing 42. COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2004310061(A) 申请公布日期 2004.11.04
申请号 JP20040056154 申请日期 2004.03.01
申请人 FUJI PHOTO FILM CO LTD 发明人 TANAKA KATSUHIKO;MOGI FUMIO
分类号 G03D3/00;G03D3/08;G03D13/00;(IPC1-7):G03D3/00 主分类号 G03D3/00
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