| 摘要 |
PROBLEM TO BE SOLVED: To provide a liquid immersed lithography system, in which while a wafer is scanned under a lens in a liquid immersed system, the vibrations of the lens, which are caused by the waves produced in a liquid tank by an accelerating force applied to the liquid, are prevented. SOLUTION: The system comprises a projection lens 1, a liquid tank 3 for accommodating a liquid LQ, and a wave shield, and a part of a workpiece W and a part of the lens are immersed in the liquid. By arranging a shield around the lens 1, the vibrations are prevented from being transferred to the projection lens 1 even if the liquid tank 3 in which the projection lens 1 is immersed is swung. COPYRIGHT: (C)2005,JPO&NCIPI |
