ELECTROSTATIC CHUCK DEVICE AND CHARGED PARTICLE APPLIED DEVICE USING THE SAME

摘要

PROBLEM TO BE SOLVED: To provide a charged particle applied technique using an electrostatic chuck device which is capable of restraining an eddy current flowing through its chuck electrode from affecting an electron beam so as to improve a pattern in positional accuracy. SOLUTION: A non-conductive part is provided inside the chuck electrode 501 to electrically shield the axis of an electron beam from a region generating a large eddy current, whereby leakage of the generated eddy current can be prevented to the axis of an electron beam. The non-conductive part is formed by providing elliptical slits 502 to the chuck electrode 501. COPYRIGHT: (C)2005,JPO&NCIPI