发明名称 Method of forming semiconductor compound film for fabrication of electronic device and film produced by same
摘要 A process of forming a compound film includes formulating a nano-powder material with a controlled overall composition and including particles of one solid solution. The nano-powder material is deposited on a substrate to form a layer on the substrate, and the layer is reacted in at least one suitable atmosphere to form the compound film. The compound film may be used in fabrication of a radiation detector or solar cell.
申请公布号 US2004219730(A1) 申请公布日期 2004.11.04
申请号 US20040474259 申请日期 2004.05.19
申请人 BASOL BULENT M. 发明人 BASOL BULENT M.
分类号 B32B5/16;B32B18/00;C23C8/02;C23C10/02;C23C12/00;C23C24/00;C23C24/08;C23C26/00;H01L;H01L21/00;H01L21/31;H01L21/8238;H01L31/032;H01L31/18;(IPC1-7):H01L21/823 主分类号 B32B5/16
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