| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To solve such problems that, when an unnecessary part of a film formed on a substrate is to be removed, a residue of the unnecessary film is generated in the part of the substrate where the unnecessary film is removed or a recess or a pinhole defect is produced in a pattern forming region. <P>SOLUTION: The apparatus for removing an unnecessary film functions to supply a chemical liquid which can dissolve the film, to the unnecessary part of the film formed on a substrate 1 through a cover member 13 having a chemical liquid supply passage 13a to supply the chemical liquid and to dissolve and remove the film in the aimed part. The apparatus has a constitution equipped with: a chemical liquid supply means 14 to supply the chemical liquid to the chemical liquid supply passage; a chemical liquid supply controlling means to control to start and stop supplying the chemical liquid; and a fluid supply means 15 to supply a gas or a liquid insoluble with the film to the chemical liquid supply passage so as to discharge the chemical liquid remaining in the chemical liquid supply passage after supplying the chemical liquid to the liquid supply passage is stopped. This invention is effective when applied for the manufacturing method of a mask blank, and further, it can be used for removing an unnecessary part of a protective film formed on an information recording medium, a color filter or the like, or for removing an unnecessary part of an insulating film formed in an electrode in the wiring on a display substrate. <P>COPYRIGHT: (C)2005,JPO&NCIPI</p> |
