发明名称 |
HOLDER FOR SEMICONDUCTOR OR LIQUID CRYSTAL MANUFACTURING SYSTEM AND SEMICONDUCTOR OR LIQUID CRYSTAL MANUFACTURING SYSTEM MOUNTING THE SAME |
摘要 |
PROBLEM TO BE SOLVED: To provide a holder for a semiconductor or liquid crystal manufacturing system in which soaking properties are enhanced on the article holding surface, and to provide a semiconductor or liquid crystal manufacturing system mounting it. SOLUTION: Soaking properties can be enhanced on the holding surface of a metal plate having an article holding surface by forming a conductive layer on an insulation layer formed on the side opposite to the holding surface. The conductive layer is preferably a heater circuit. Furthermore, durability can be enhanced by setting the difference of thermal expansion coefficient between the metal plate and the insulation layer not larger than 4.0×10<SP>-6</SP>/°C. When such a holder is mounted on a semiconductor production system or a liquid crystal production system, a semiconductor or liquid crystal production system exhibiting high productivity and yield can be provided. COPYRIGHT: (C)2005,JPO&NCIPI |
申请公布号 |
JP2004311850(A) |
申请公布日期 |
2004.11.04 |
申请号 |
JP20030105927 |
申请日期 |
2003.04.10 |
申请人 |
SUMITOMO ELECTRIC IND LTD |
发明人 |
HIIRAGIDAIRA HIROSHI;NATSUHARA MASUHIRO;NAKADA HIROHIKO |
分类号 |
C23C16/46;H01L21/02;H01L21/205;H01L21/68;H01L21/683;(IPC1-7):H01L21/02 |
主分类号 |
C23C16/46 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|