发明名称 HOLDER FOR SEMICONDUCTOR OR LIQUID CRYSTAL MANUFACTURING SYSTEM AND SEMICONDUCTOR OR LIQUID CRYSTAL MANUFACTURING SYSTEM MOUNTING THE SAME
摘要 PROBLEM TO BE SOLVED: To provide a holder for a semiconductor or liquid crystal manufacturing system in which soaking properties are enhanced on the article holding surface, and to provide a semiconductor or liquid crystal manufacturing system mounting it. SOLUTION: Soaking properties can be enhanced on the holding surface of a metal plate having an article holding surface by forming a conductive layer on an insulation layer formed on the side opposite to the holding surface. The conductive layer is preferably a heater circuit. Furthermore, durability can be enhanced by setting the difference of thermal expansion coefficient between the metal plate and the insulation layer not larger than 4.0×10<SP>-6</SP>/°C. When such a holder is mounted on a semiconductor production system or a liquid crystal production system, a semiconductor or liquid crystal production system exhibiting high productivity and yield can be provided. COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2004311850(A) 申请公布日期 2004.11.04
申请号 JP20030105927 申请日期 2003.04.10
申请人 SUMITOMO ELECTRIC IND LTD 发明人 HIIRAGIDAIRA HIROSHI;NATSUHARA MASUHIRO;NAKADA HIROHIKO
分类号 C23C16/46;H01L21/02;H01L21/205;H01L21/68;H01L21/683;(IPC1-7):H01L21/02 主分类号 C23C16/46
代理机构 代理人
主权项
地址