发明名称 ION-IMPLANTATION EQUIPMENT FOR IMPROVING INNER STRUCTURE OF POWER SUPPLY
摘要 PURPOSE: Ion-implantation equipment is provided to check periodically a resistor for restraining secondary electrons by improving an inner structure of a power supply. CONSTITUTION: Ion-implantation equipment includes a power supply and a tester. The power supply include a resistor(40), electric wires(42) connected with both terminals of the resistor, and a pair of connectors(44) exposed to the outside. The connectors are connected with the electric wires, respectively. At this time, a voltage is applied from the power supply through the resistor in order to restrain secondary electrons from being generated at an analyzing part, an accelerating part, or a scan part. The tester(50) is used for measuring periodically the magnitude of the resistor through the connectors.
申请公布号 KR20040092585(A) 申请公布日期 2004.11.04
申请号 KR20030026070 申请日期 2003.04.24
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 CHAE, SEUNG WON;KIM, SU MAN;LIM, TAE SEOP
分类号 H01L21/265;(IPC1-7):H01L21/265 主分类号 H01L21/265
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