发明名称 |
ION-IMPLANTATION EQUIPMENT FOR IMPROVING INNER STRUCTURE OF POWER SUPPLY |
摘要 |
PURPOSE: Ion-implantation equipment is provided to check periodically a resistor for restraining secondary electrons by improving an inner structure of a power supply. CONSTITUTION: Ion-implantation equipment includes a power supply and a tester. The power supply include a resistor(40), electric wires(42) connected with both terminals of the resistor, and a pair of connectors(44) exposed to the outside. The connectors are connected with the electric wires, respectively. At this time, a voltage is applied from the power supply through the resistor in order to restrain secondary electrons from being generated at an analyzing part, an accelerating part, or a scan part. The tester(50) is used for measuring periodically the magnitude of the resistor through the connectors.
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申请公布号 |
KR20040092585(A) |
申请公布日期 |
2004.11.04 |
申请号 |
KR20030026070 |
申请日期 |
2003.04.24 |
申请人 |
SAMSUNG ELECTRONICS CO., LTD. |
发明人 |
CHAE, SEUNG WON;KIM, SU MAN;LIM, TAE SEOP |
分类号 |
H01L21/265;(IPC1-7):H01L21/265 |
主分类号 |
H01L21/265 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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