| 摘要 |
PURPOSE: A projection optical system, an exposure apparatus and a preparation method of a device are provided, to allow projection to be carried out with a high precision without the expansion of the total system. CONSTITUTION: The projection optical system(100) comprises a first reflection surface(M1), a second reflection surface(M2), a third reflection surface(M3), a fourth reflection surface(M4), a fifth reflection surface(M5) and a sixth reflection surface(M6) in turn along the optical path from the side of a body to the upper side, and projects the pattern of a mask located on the surface of a body on the substrate(W) located on an image surface, wherein the third reflection surface has a convex shape, and the projection system forms an intermediate image of a pattern formed on the mask between the third reflection surface and the fourth reflection surface. Preferably the main ray reflected on the third reflection surface is reflected to the direction being apart from the optical axis(AX) along which the six reflection surfaces are located, with an angle of 12-70 degrees to the optical axis.
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