发明名称 |
METHODS FOR MAKING REINFORCED WAFER POLSHING PADS AND APPARATUSES IMPLEMENTING THE SAME |
摘要 |
As one of many embodiments of the present invention, a seamless polishing apparatus for utilization in chemical mechanical polishing is provided. The seamless polishing apparatus includes a polishing pad (156) where the polishing pad (156) is shaped like a belt and has no seams. The seamless polishing apparatus also includes a base belt (157) where the base belt (157) includes a reinforcement layer (182) and a cushioning layer (184). In addition, the cushioning layer (184) is an intermediary layer between the polishing belt pad (156) and the base belt (157). |
申请公布号 |
EP1345733(B1) |
申请公布日期 |
2004.11.03 |
申请号 |
EP20010995441 |
申请日期 |
2001.12.07 |
申请人 |
LAM RESEARCH CORPORATION |
发明人 |
XU, CANGSHAN;ZHAO, EUGENE, Y.;DAI, FEN |
分类号 |
B24B37/22;B24B37/26;B24D11/00;B24D18/00;H01L21/304;(IPC1-7):B24B37/04 |
主分类号 |
B24B37/22 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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