发明名称 MANUFACTURING METHOD FOR ELECTROOPTICAL DEVICE, AND ELECTROOPTICAL DEVICE, AS WELL AS ELECTRONIC APPARATUS
摘要 PROBLEM TO BE SOLVED: To provide a manufacturing method of an electrooptical deivce capable of precisely flattening an inter-layer insulating film (a flattened insulating film) for forming an excellent organic EL element, and provide an electrooptical device, as well as an electronic apparatus. SOLUTION: The manufacturing method of the electrooptical device having a flattened insulating film 284 between a substrate 20 and a light-emitting layer 60 comprises a process of laminating and forming a plurality of flattened insulating films. COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2004303645(A) 申请公布日期 2004.10.28
申请号 JP20030097258 申请日期 2003.03.31
申请人 SEIKO EPSON CORP 发明人 KAYANO YUJI
分类号 H05B33/10;H01L51/50;H05B33/02;H05B33/14;(IPC1-7):H05B33/10 主分类号 H05B33/10
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