| 摘要 |
PROBLEM TO BE SOLVED: To effectively remove a silicon-containing DLC (diamond like carbon) film. SOLUTION: A plasma 20 is generated by supplying argon gas, hydrogen gas and oxygen gas to a plasma gun 18, and the oxygen ionized by the plasma 20 reacts with a carbon component and a hydrogen component in the silicon-containing DLC film formed on the surfaces of substrates to be treated 54, 54, etc. Thereby, the carbon component and the hydrogen component are removed as carbon gas and water. Meanwhile, the ionized oxygen reacts with a silicon component in the silicon-containing DLC film to generate silicon oxide on the surfaces of the plurality of the substrates to be treated 54. When the oxygen gas supply is withdrawn, the silicon oxide reacts with the ionized hydrogen gas and is removed as silane gas and water. Supplying and withdrawal of the oxygen gas is alternately performed. COPYRIGHT: (C)2005,JPO&NCIPI
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