LOADLOCK CHAMBER MOUNTED ON EQUIPMENT FOR DEPOSITING BPSG LAYER TO SHORTEN INTERVAL OF PROCESS TIME

摘要

PURPOSE: A loadlock chamber mounted on equipment for depositing a BPSG(boron phosphorous silicate glass) layer is provided to shorten an interval of process time by including at least 18 slots and by storing lots of wafers in a loadlock chamber at a time. CONSTITUTION: The wafers(W) are stored in two loadlock trays(21). The wafers are carried to/from each loadlock tray through an opening located in a side of each loadlock tray. A support unit supports each loadlock tray, positioned under each loadlock tray. A motor vertically moves the loadlock tray, positioned under the support unit. The wafers are placed on the slots(2) attached to the inner wall of each loadlock tray wherein the number of the slots are not less than 18.