<p>A sputtering chamber comprising a liner is provided. The liner is adapted to reduce spalling of sputtered coating (overcoat) from interior surfaces of the chamber. The liner can be mounted adjacent a selected interior surface of the chamber. The liner is preferably removable. Also provided are sputtering methods wherein the present liners are used.</p>
申请公布号
WO2004093121(A1)
申请公布日期
2004.10.28
申请号
WO2004US11400
申请日期
2004.04.13
申请人
CARDINAL CG COMPANY;STEBBINS, DAVID;STANEK, ROGER;HARTIG, KLAUS
