| 摘要 |
PROBLEM TO BE SOLVED: To provide an aligner capable of comparatively freely adjusting a wiring space or the like in accordance with the design specification of a wiring pattern. SOLUTION: Since a projection unit 6 is equipped with a magnification zoom unit 67 for changing the projection scale factor of a projection image, the projection image of a pattern formed by a masking device 4 can be adjusted so as to obtain a desired size. Accordingly, the pattern is formed with a phased size due to a plurality of pitches of elements arrayed periodically in a variable pattern producing mask VM provided in the masking device 4. However, the size of a projection image can be changed by the magnification zoom unit 67 upon projecting on a plate PL as the projection image, whereby the sizes of respective units such as the wiring space or the like in the projection image can be adjusted continuously into arbitrary sizes. COPYRIGHT: (C)2005,JPO&NCIPI
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