| 摘要 |
PROBLEM TO BE SOLVED: To provide a slide shutter apparatus for vacuum film deposition in which a shutter is placed in a vacuum chamber, the position of the shutter is finely adjusted, and the operational range is reduced in addition to the consistent and smooth operation when depositing crystal by using a vacuum device such as a sputtering apparatus and a vacuum vapor deposition apparatus. SOLUTION: The slide shutter apparatus for vacuum film deposition comprises an external operation unit 2 to be operated from the outer side of a chamber, a shaft 3 to be rotated in an interlocking manner with the external operation unit 2, a shutter moving cylindrical part 5 which is freely inserted in the outer circumference of the shaft 3, and a shutter 7 which is provided on the outer circumference of the shutter moving cylindrical part 5 to lock the shutter moving cylindrical part 5, and fitted to a tip 5a of the shutter moving cylindrical part 5. The shutter moving cylindrical part 5 is translated in the longitudinal direction by the rotation of the shaft 3. COPYRIGHT: (C)2005,JPO&NCIPI
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