| 摘要 |
<p><P>PROBLEM TO BE SOLVED: To obtain an image exposure system in which image quality is prevented from deteriorating by preventing emergence of a "streak" caused by a variation in exposing position incident to use of an array light source having a plurality of light emitting element arrays or a wide aperture lens, characteristics of a silver halide photosensitive material, and the like. <P>SOLUTION: The image exposure system comprises a plurality of arrays where a plurality of light emitting elements are arrange in line, an array light source group including at least one zigzag array light source (first array light source 21 to third array light source 23) constituted by shifting one of adjacent light emitting element arrays in the longitudinal direction, a means (dichroic prism 30) for forming a linear outgoing light by mixing lights emitted from the array light source group, and a means (SELFOC (R) lens array 40) for focusing the outgoing light formed by the light mixing means to a silver halide photosensitive material (photographic paper 10) wherein the interval d of the light emitting element arrays in the array light source arranged in zigzag is set within 500μm. <P>COPYRIGHT: (C)2005,JPO&NCIPI</p> |
