HEATING APPARATUS AND METHOD, AND TREATMENT SUBSTRATE

摘要

PROBLEM TO BE SOLVED: To provide a heating apparatus which performs an aftertreatment such as an etching well by means of heating an object to be heated with a complicated temperature distribution pattern using a simpler structure. SOLUTION: The device comprises a infrared lamp 41 which irradiates a substrate for treatment W with a light beam to heat the substrate W and a mask M placed between the infrared lamp 41 and the substrate W, made of copper which reflects wavelength of irradiated light with apertures Ma of prescribed pattern. COPYRIGHT: (C)2005,JPO&NCIPI