MANUFACTURING METHOD AND MANUFACTURING DEVICE OF SUBSTRATE FOR PLASMA DISPLAY

摘要

PROBLEM TO BE SOLVED: To provide a manufacturing method and a manufacturing device of a substrate for a plasma display capable of improving productivity by allowing measurement of application thickness in a wet condition after application to remarkably reduce an application thickness check time for application state confirmation when phosphor paste is applied to grooves of the substrate for a plasma display composed by forming a dielectric layer on a glass substrate having electrodes and by forming the grooves between barrier ribs for storing the phosphor paste on the dielectric layer. SOLUTION: This manufacturing method of a substrate for a plasma display has a process for applying the phosphor paste to the grooves between the barrier ribs of the substrate with at least the barrier ribs formed. By measuring height Ha of the bottom surface of each groove before the phosphor paste application and height Hb of the phosphor paste surface after the phosphor paste application by reciprocating one height detector in a direction parallel with the barrier walls, the application thickness of the phosphor paste is obtained from the difference between the height Hb and the height Ha. COPYRIGHT: (C)2005,JPO&NCIPI