发明名称 ROSIN-MODIFIED PHENOL RESIN
摘要 PROBLEM TO BE SOLVED: To obtain a resin for offset printing ink excellent in gloss and flowability without spoiling antimisting properties in printing. SOLUTION: This rosin-modified phenol resin is produced by using 100 pts. mass component (A) obtained by reacting a rosin (1), a dimer acid (2), a resol type phenol resin (3) and a polyhydric alcohol(4) and 1-20 pts.mass component (B) comprising≤10 pts.mass monomer acid component,≥70 pts.mass dimer acid component and≤20 pts.mass trimer acid component. COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2004300399(A) 申请公布日期 2004.10.28
申请号 JP20030126736 申请日期 2003.03.28
申请人 HITACHI KASEI POLYMER CO LTD 发明人 TAKIGAWA TETSUYA
分类号 C08G8/34;(IPC1-7):C08G8/34 主分类号 C08G8/34
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