SYSTEMS AND METHODS FOR IMPROVED GAS DELIVERY

摘要

An improved chemical vapor deposition system including a lid having (110) a channel (120) configured for delivering reactive cleaning gas to the interior of the vapor deposition system (100). The lid (110) including a cleaning gas distribution channel (120) fluidly connected to a plurality of cleaning gas injection ports (130). The lid (110) geometry is configured to generate desirable concentration gradients of reactive cleaning gas to the interior of a vapor deposition chamber (100). In some embodiments, the concentration gradient is selected to compensate for the temperature dependence of cleaning reactions. Methods of using the disclose system are disclosed.