POLISHING PAD AND METHOD FOR PRODUCING SAME

摘要

A polishing pad is disclosed which enables to stably polish the surface of an object smooth and flat by applying the polishing technique for determining when polishing is completed. A method for producing such a polishing pad is also disclosed. A polishing pad (10) is composed of a light-transmitting pad having a polishing surface (11a) on the front side. By forming a recess (12) on the back side (11b) of the light-transmitting pad (11), the light transmittance can be locally changed. The light-transmitting pad (11) has a light transmittance of not less than 10%, preferably of not less than 30%, to at least a light having a wavelength within the region of 350-900 nm. The light-transmitting pad (11) has a light transmittance of not less than 10% preferably over the light wavelength region of 370-900 nm, more preferably over the light wavelength region of 390-900 nm. The light-transmitting pad (11) has a light transmittance of not less than 30% preferably over the light wavelength region of 400-900 nm, more preferably over the light wavelength region of 450-900 nm.