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发明名称
Verfahren zur Herstellung eines Heterobipolartransistors mittels zweischichtiger Photolacks
摘要
申请公布号
DE69729346(T2)
申请公布日期
2004.10.28
申请号
DE1997629346T
申请日期
1997.03.27
申请人
NORTHROP GRUMMAN CORP., LOS ANGELES
发明人
OKI, AARON KENJI;UMEMOTO, DONALD KATSU;TRAN, LIEM T.;STREIT, DWIGHT CHRISTOPHER
分类号
H01L29/73;H01L21/331;H01L29/205;H01L29/737;(IPC1-7):H01L29/737
主分类号
H01L29/73
代理机构
代理人
主权项
地址
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