| 摘要 |
PROBLEM TO BE SOLVED: To provide a detecting device with the high accuracy which can effectively restrict the occurrence of a detection error at a face position caused by a reflection characteristic (variations of a reflectivity) in a light flux incident region in a defocus state also. SOLUTION: This position detecting device comprises irradiation systems (1 to 17) in which a pair of detected light fluxes are obliquely entered into a specific region of an object plane (W) and a monitor light flux is entered almost vertically into the specific region of the object plane, a pupil division element (21) for introducing the pair of detected light fluxes from the object plane through objective optical systems (16, 13) along optical paths different from each other, detection systems (24, 26) for detecting a face position of the object face based on the pair of detected light fluxes through the pupil division element, and monitor systems (24, 26) for detecting the optical characteristic in the specific region of the object plane based on a monitor light flux. COPYRIGHT: (C)2005,JPO&NCIPI |
