| 摘要 |
PROBLEM TO BE SOLVED: To provide a substrate on which a plurality of optical elements are formed by exposure in plurality of shots and the positional relationship among the optical elements can be stably obtained with high accuracy, and to provide an exposure method to realize the above described substrate. SOLUTION: The exposure method includes: a process of disposing a substrate in a first exposure position; a first exposure process to form a first optical element and a first position indicating pattern on the substrate; and further, a process of disposing the substrate in a second exposure position; and a second exposure process to form a second optical element and a second position indicating pattern on the substrate. The first position indicating pattern and the second position indicating pattern are formed to correspond to each other, and the distance between these patterns indicates the relative position of the first optical element and the second optical element with respect to the X, Y andθdirections. COPYRIGHT: (C)2005,JPO&NCIPI |
