发明名称 Exposure apparatus
摘要 An object of the present invention is to provide an exposure apparatus which is capable of obtaining high illumination efficiency and performing uniform exposure. In accordance with the exposure apparatus that includes a light source, an optical integrator to which light is supplied from the light source and a two-dimensional spatial light modulator illuminated by light which has transmitted the optical integrator, an optical fiber bundle end portion for emitting light to the optical integrator is provided in the light source, and the light-emitting area of the optical fiber bundle end portion is, as seen from the light-emitting side, substantially similar to the contour configuration of light-emitting surface of the optical integrator. Thus, most of the light emitted from the optical fiber bundle end portion can be illuminated onto a set illumination area. As a result, high illumination efficiency can be obtained and uniform exposure can be realized.
申请公布号 US2004213530(A1) 申请公布日期 2004.10.28
申请号 US20040761417 申请日期 2004.01.22
申请人 FUJI PHOTO FILM CO., LTD. 发明人 OMORI TOSHIHIKO
分类号 G02B26/08;B41J2/46;G02B6/00;G02B6/06;G02B27/00;G03F7/20;H01L21/027;H04N5/74;(IPC1-7):G02B6/06 主分类号 G02B26/08
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