发明名称 |
RUN-OFF PATH TO COLLECT LIQUID FOR AN IMMERSION LITHOGRAPHY APPARATUS |
摘要 |
An exposure apparatus (10) for transferring an image to a device (30) includes an optical assembly (16), an immersion fluid system (252), and a device stage assembly (20). The optical assembly (16) is positioned a gap (246) above the device (30). The immersion fluid system (252) fills the gap (246) with an immersion fluid (248). The device stage assembly (20) includes a sloped region (282) that facilitates movement of the immersion fluid (248) that exits the gap (246) away from the device (30). The device stage assembly (20) can include a collection region (284) and a recovery system (286) that recovers immersion fluid (248) from the collection region (284). |
申请公布号 |
WO2004093160(A2) |
申请公布日期 |
2004.10.28 |
申请号 |
WO2004US09993 |
申请日期 |
2004.04.01 |
申请人 |
NIKON CORPORATION;NOVAK, THOMAS, W. |
发明人 |
NOVAK, THOMAS, W. |
分类号 |
G03B27/42;G03F7/20;H01L |
主分类号 |
G03B27/42 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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