发明名称 METHOD FOR PRODUCTION ELECTROMAGNETIC WAVE SHIELD BODY
摘要 PROBLEM TO BE SOLVED: To attain a sufficient opening rate without sacrificing the visibility. SOLUTION: The method for producing an electromagnetic wave shield body comprises a step for forming a UV-curing black layer 34 and a silver layer 35, in layer, on the surface of a transparent glass 30, a step for pattern exposing and developing them through a pattern mask and exposing the black layer 34 from the rear side of the transparent glass 30 to form an intermediate body 37, and a step for forming a conductive pattern of an electromagnetic wave shield layer by heat treating the intermediate body 37. Line width of the black layer 34 patterned during development is set narrower than the line width of the patterned silver layer 35. Since the line width of the black layer 34 is set narrower than the line width of the silver layer 35 during the development and the silver layer 35 of the electromagnetic wave shield layer is shrunk during the heat treatment, conductivity and a high opening rate can be attained, . COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2004303765(A) 申请公布日期 2004.10.28
申请号 JP20030091516 申请日期 2003.03.28
申请人 SHIN ETSU POLYMER CO LTD 发明人 MASAHIRO YASUSHI;ODAJIMA SATOSHI;EGAWA TOSHIHIKO;HOSONO NORIYOSHI;ISHIDA JUNYA
分类号 H05K9/00;(IPC1-7):H05K9/00 主分类号 H05K9/00
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