发明名称 |
SUBSTRATE FOR ELECTROOPTICAL DEVICE, ITS MANUFACTURING METHOD, AND ELECTROOPTICAL DEVICE |
摘要 |
PROBLEM TO BE SOLVED: To prevent occurrence of short-circuit among pixel electrodes and to suppress adverse effect caused by lateral electric field. SOLUTION: The substrate for the electrooptical device is provided with: an interlayer film 44 which separates film forming patterns formed in a layered manner on the substrate; a groove section 111 formed on the interlayer film 44; and a pixel electrode 9a formed in the groove section 111. COPYRIGHT: (C)2005,JPO&NCIPI
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申请公布号 |
JP2004302382(A) |
申请公布日期 |
2004.10.28 |
申请号 |
JP20030098259 |
申请日期 |
2003.04.01 |
申请人 |
SEIKO EPSON CORP |
发明人 |
ITO SATOSHI |
分类号 |
G02F1/1333;G02F1/1343;G09F9/30;H01L21/3205;H01L21/768;H01L51/50;H05B33/10;H05B33/14;H05B33/26;(IPC1-7):G09F9/30;G02F1/133;G02F1/134;H01L21/320 |
主分类号 |
G02F1/1333 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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