发明名称 CHEMICAL DOSING METHOD AND CHEMICAL DOSING DEVICE
摘要 PROBLEM TO BE SOLVED: To provide a simple chemical dosing method and a small chemical dosing device which control discharge amount and remaining amount of chemicals at the same time by a liquid level gage. SOLUTION: A pipe-shaped liquid level measuring tank 10 having a smaller cross sectional area than the chemical storage tank 1 is provided on the piping 60 located between a chemical storage tank 1 and a pump 20. The liquid level gage 40 continuously measuring the level of the liquid level measuring tank 10 is provided at the top part of the liquid level measuring tank 10 and an on-off valve 30 is provided between the chemical storage tank and the liquid level measuring tank. The method and device calculate the amount of chemical stored in the chemical storage tank 1 from the maximum liquid level of the liquid level measuring tank 10 when the on-off valve 30 is open, and the discharge amount of the pump 20 from the decreasing rate of the liquid level of the liquid level measuring tank 10 when the on-off valve 30 is close. COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2004301622(A) 申请公布日期 2004.10.28
申请号 JP20030094187 申请日期 2003.03.31
申请人 HAKUTO CO LTD 发明人 ONISHI NORIHIKO
分类号 G01F1/00;G01F13/00;(IPC1-7):G01F1/00 主分类号 G01F1/00
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