发明名称 EVAPORATION MASK AND EVAPORATION METHOD USING THE SAME
摘要 PROBLEM TO BE SOLVED: To provide an evaporation mask which enables repetitive use of an existing evaporation mask when evaporating an evaporant material for forming back plates on a prescribed number or more of evaporation target members and enables cost reduction, and an evaporation method using the same. SOLUTION: The evaporation mask 12 has a plurality of apertures 15 for forming a prescribed evaporation pattern on a translucent substrate 10 by evaporating the evaporant material 4 stored inside an evaporant material-storage vessel 3 and a plurality of mask parts 16 for blocking the formation of the evaporation pattern on the translucent substrate 10. Thin films 39 are formed through organic vapor deposition on the inner wall surface 37 of the aperture 15 and on the rear part 38 of the mask part 16 which is included in the mask part 16 region. COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2004300495(A) 申请公布日期 2004.10.28
申请号 JP20030093676 申请日期 2003.03.31
申请人 NIPPON SEIKI CO LTD 发明人 ONO TOMOHIRO;WATANABE SHUNSUKE;SANO YUSUKE;KARO KAZUNORI;SHIMOTORI YUTAKA
分类号 H05B33/10;C23C14/04;C23C14/24;H01L51/50;H05B33/14;(IPC1-7):C23C14/04 主分类号 H05B33/10
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