| 摘要 |
PROBLEM TO BE SOLVED: To provide a standard sample for fluorescent X-ray analysis which can form a required amount of a contaminated metal without conducting a destructive inspection of wafers for calibration. SOLUTION: A Ni film 120 containing Ni atoms is selectively formed on a Si substrate 110. The Ni film contains a predetermined concentration of Ni atoms and has a predetermined thickness and surface area. By using these values, the amount of Ni atoms included in the Ni film 120 can be calculated. For example, if the Ni film is made of pure Ni metal, the concentration of Ni atoms is around 9.12E22 atoms/cm<SP>3</SP>. Therefore, the Ni film 120 having a thickness of 3 nm and a surface area of 10 X 10μm<SP>2</SP>contains approximately 2.74E10 atoms. COPYRIGHT: (C)2005,JPO&NCIPI
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