发明名称 METHOD FOR INSPECTING FLAW OF PATTERN AND INSPECTION DEVICE THEREFOR
摘要 PROBLEM TO BE SOLVED: To realize an optical system constituted so as to optimize the accumulation time of a TDI sensor to be used and necessary light source power and to realize the shortening of an inspection time and the reduction of light source power while preventing the occurrence of a speckle. SOLUTION: In this pattern flaw inspecting method for irradiating a sample to be measured having a pattern formed thereon with a laser beam to acquire the image of the pattern and inspecting the flaw of the sample based on the image, the TDI sensor 121, which has unidimensional sensors arranged thereto in a signal accumulating direction in a multistage fashion, is used as a sensor for acquiring the image and the sample 118 is moved in the direction corresponding to the signal accumulating stage direction of the TDI sensor 121 while the surface of the sample is irradiated with a laser beam, which corresponds to the dimension in the signal accumulating stage direction of the TDI sensor 121 and is long in a sample moving direction, to scan the laser beam in the direction crossing the sample moving direction at a right angle. COPYRIGHT: (C)2005,JPO&NCIPI
申请公布号 JP2004301705(A) 申请公布日期 2004.10.28
申请号 JP20030095672 申请日期 2003.03.31
申请人 TOSHIBA CORP;TOPCON CORP 发明人 TOJO TORU;WATANABE TOSHIYUKI;ISOMURA IKUNAO;MATSUKI KAZUTO;OGAWA TSUTOMU;SEKINE AKIHIKO
分类号 G01B11/24;G01N21/956;H01L21/66;(IPC1-7):G01N21/956 主分类号 G01B11/24
代理机构 代理人
主权项
地址