发明名称 ELECTROLESS PLATING METHOD
摘要 An electroless plating method of the present invention includes the steps of preparing a substrate having an insulating body and a conductive pattern formed thereon, adhering a catalytic metal serving as a catalyst of an electroless plating onto the insulating body and the conductive pattern, forming selectively a protection film or an oxidizing agent used to oxidize the catalytic metal on the catalytic metal in a space portion between the conductive pattern, and forming selectively a metal layer on the conductive pattern by the electroless plating.
申请公布号 US2004213912(A1) 申请公布日期 2004.10.28
申请号 US20040709138 申请日期 2004.04.15
申请人 SHINKO ELECTRIC INDUSTRIES CO., LTD. 发明人 MURAYAMA KEI
分类号 C23C18/30;C23C18/16;C23C18/28;H05K3/18;H05K3/24;H05K3/28;(IPC1-7):B05D1/36 主分类号 C23C18/30
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