<p>A resist stripping method and device that enable resist on a substrate surface to be stripped with high efficiency. A method of stripping resist on a substrate surface includes at least a step (1) of applying an ozone solution to a surface to be treated and the step (2) of applying an organic solvent to the surface to be treated.</p>
申请公布号
WO2004093172(A1)
申请公布日期
2004.10.28
申请号
WO2004JP05452
申请日期
2004.04.16
申请人
SEKISUI CHEMICAL CO. LTD.;YAMAZAKI, KAZUTOSHI;FURUNO, YOSHIHIKO;FUJIMORI, YOJI
