| 摘要 |
<p>A 1-azaallyl compound (1) is new. A 1-azaallyl compound of formula (1) is new. [Image] R1H, 1-6C alkyl, alkenyl, alkynyl, fluoroalkyl, fluoroalkenyl, or fluoroalkynyl; R2H, 1-6C alkyl, alkenyl, alkynyl, fluoroalkyl, fluoroalkenyl, fluoroalkynyl, alkoxy, fluoroalkoxy or Si(R5)3; R5alkyl, alkenyl, alkynyl, fluoroalkyl, fluoroalkenyl, fluoroalkynyl, alkoxy, fluoroalkoxy; R3,R4H, 1-6C alkyl, alkenyl, alkynyl, fluoroalkyl, fluoroalkenyl, fluoroalkynyl, alkoxy, fluoroalkoxy, or Si(R'5)3; R'51-6C alkyl, alkenyl, alkynyl, fluoroalkyl, fluoroalkenyl, fluoroalkynyl, alkoxy, or fluoroalkoxy. Independent claims are also included for: (1) a metal coordination complex of 1-azaallyl compound of formulae (2) or (3); (2) a process for depositing a metal on a substrate using the 1-azaallyl metal compound as a volatile precursor in a chemical vapor deposition (CVD) process, where vapors of the precursor are contacted with a substrate surface in the presence of a gas, a reagent gas or gases under conditions of elevated temperature and/or a plasma, so that a chemical reaction occurs on the surface of the substrate to deposit a metal containing film; (3) a compound Et(N)C(tBu)CH2SiMe3; (4) a compound of formula [Me3SiCHC(tBu)-N(Et)]2 (M+>2>); and (5) a compound of formula [Me3SiCHC(tBu)-N(Et)]3 (M+>3>). [Image] M : Li, Cu(I), Na(I), K(I), Au(I), Ag(I), Fe(II), Co(II), Cu(II), Zn(II), Mg(II), Ca(II), Sr(II), Ba(II), Pd(II), Pt(II), or Ni(II); M+>2>Mg, Sr, Ba, Fe, Ni, Pd, Pt, or Zn; M+>3>Y, La, Ti, Zr, Hf, Nb, Ta, Cr, W, Ru, Os, Rh, Ir, Ag, Au, Co, Ru, Pt, Pd, Ni, Os, Ir, Fe, Na, K or Li.</p> |
